Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit
Design Patent
2007-05-22
2007-05-22
Sikder, Selina (Department: 2912)
Equipment for production, distribution, or transformation of ene
Distribution, modification or control
Semiconductor, transistor or integrated circuit
Design Patent
active
29213841
CLAIM:
The ornamental design for a photomask blank, as shown and described.
REFERENCES:
patent: 1676741 (1928-07-01), Moskowitz
patent: 2728451 (1955-12-01), Leander
patent: 5112727 (1992-05-01), Inui et al.
patent: 5217256 (1993-06-01), Lomas
patent: 5234781 (1993-08-01), Sakamoto et al.
patent: 6122035 (2000-09-01), Rolson
patent: D441730 (2001-05-01), Oba
patent: 6285783 (2001-09-01), Isomura et al.
patent: D502866 (2005-03-01), Woollard
patent: 2002/0187407 (2002-12-01), Priestley et al.
patent: 2003/0118918 (2003-06-01), Ohta
patent: 2003/0198873 (2003-10-01), Kokjohn
patent: 2004/0265708 (2004-12-01), Misaka
patent: 2005/0120326 (2005-06-01), Semmler et al.
patent: 2005/0147893 (2005-07-01), Ogawa et al.
patent: 2005/0269814 (2005-12-01), Dillavou et al.
U.S. Appl. No. 29/213,940, filed Sep. 23, 2004, Inventor: Masaru Mitsui; Entitled: Photomask Blank.
Matsui Shigekazu
Mitsui Masaru
Nagarekawa Osamu
Ushida Masao
Frishauf Holtz Goodman & Chick P.C.
Hoya Corporation
Sikder Selina
LandOfFree
Photomask blank does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask blank, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask blank will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3728797