Photomask blank

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit

Design Patent

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Design Patent

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29213841

CLAIM:
The ornamental design for a photomask blank, as shown and described.

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U.S. Appl. No. 29/213,940, filed Sep. 23, 2004, Inventor: Masaru Mitsui; Entitled: Photomask Blank.

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