4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Orlando Escorcia

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Fluorine-free plasma curing process for porous low-k materials

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Reexamination Certificate

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Plasma ashing process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma ashing process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma ashing process for removing photoresist and residues...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Reexamination Certificate

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Plasma curing of MSQ-based porous low-k film materials

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2661857

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