4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Neal R. Rueger

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Atomic layer deposition using electron bombardment

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
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Atomic layer deposition using electron bombardment

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Cleaning efficiency improvement in a high density plasma...

Drying and gas or vapor contact with solids – Process – Gas or vapor contact with treated material
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Deposition and chamber treatment methods

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Deposition and chamber treatment methods

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
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Profile ID: LFUS-PAI-P-2254858

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