Atomic layer deposition using electron bombardment

Details Atomic layer deposition using electron bombardment Atomic layer deposition using electron bombardment

2007-03-13

2007-03-13

Kunemund, Robert (Department: 1722)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Forming from vapor or gaseous state

With decomposition of a precursor

C117S089000, C117S086000, C117S094000, C117S095000, C117S108000, C118S715000, C118S718000

Reexamination Certificate

active

10879825

ABSTRACT:
Formation of a layer of material on a surface by atomic layer deposition methods and systems includes using electron bombardment of the chemisorbed precursor.

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