Atomic layer deposition using electron bombardment

Details Atomic layer deposition using electron bombardment Atomic layer deposition using electron bombardment

2007-02-09

2009-12-08

Kunemund, Robert M (Department: 1792)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Forming from vapor or gaseous state

With decomposition of a precursor

C117S094000, C117S095000, C117S105000

Reexamination Certificate

active

07628855

ABSTRACT:
Formation of a layer of material on a surface by atomic layer deposition methods and systems includes using electron bombardment of the chemisorbed precursor.

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