4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Monte M. Toole

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High-pressure, high-temperature gaseous chemical apparatus

Coating apparatus – Condition responsive control
Patent

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High-pressure, high-temperature gaseous chemical method for sili

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
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Method and apparatus for batch processing a semiconductor wafer

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Silicon wafer steam oxidizing apparatus

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
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Profile ID: LFUS-PAI-P-730634

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