Coating apparatus – Condition responsive control
Patent
1977-03-09
1979-09-18
Smith, John D.
Coating apparatus
Condition responsive control
118692, 118724, 422112, 422242, 427 93, C23C 1312
Patent
active
041679156
ABSTRACT:
Apparatus and method for growing oxide on silicon wafers or silicon-coated wafers or other semiconductors for the semiconductor industry wherein the oxide growth is produced under high pressure and high temperature conditions within a reaction chamber by oxidizing gases which are maintained in a continuous flow condition into and through the chamber.
REFERENCES:
patent: 3446659 (1969-05-01), Wisman et al.
patent: 3865647 (1975-02-01), Reuschel
patent: 3907981 (1975-09-01), Henrie
patent: 4018183 (1977-04-01), Meulemin
patent: 4018184 (1977-04-01), Nagasawa et al.
Klein Raphael
Toole Monte M.
Atomel Corporation
Smith John D.
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