Apparatus for processing a sample using a charged beam and react

Details Apparatus for processing a sample using a charged beam and react Apparatus for processing a sample using a charged beam and react

1993-03-31

1994-08-30

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723MP, 118723FE, 156345, H01J 3730

Patent

active

053424484

ABSTRACT:
A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.

REFERENCES:
patent: 4874947 (1989-10-01), Ward et al.
patent: 4936968 (1990-06-01), Ohnishi et al.
patent: 5223109 (1993-06-01), Itoh et al.

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