Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
Inventor
active
Method for fabricating gate oxide layer
Method for fabricating semiconductor device
Method for high-density plasma etching
Method for manufacturing metal oxide semiconductor...
Method for removing photoresist layer
No associations
LandOfFree
Michael W C Huang does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Michael W C Huang, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Michael W C Huang will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-1814358