4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Mei Cheng

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Magnetron-enhanced plasma etching process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Materials and methods for etching silicides, polycrystalline sil

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Passive shield for CVD wafer processing which provides frontside

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Profile ID: LFUS-PAI-P-46109

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