Passive shield for CVD wafer processing which provides frontside

Details Passive shield for CVD wafer processing which provides frontside Passive shield for CVD wafer processing which provides frontside

1992-01-22

1994-04-19

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Work support

118715, 118719, 156345, 156643, H01L 2100

Patent

active

053042484

ABSTRACT:
An improved apparatus for CVD processing is described wherein a wafer mounted on a vertically movable susceptor beneath a gas outlet or showerhead is raised into contact with a shield ring which normally rests on a ring support in the chamber. The shield ring engages the frontside edge of the wafer, lifting the shield ring off its support, when the susceptor and the wafer 10 are raised to a deposition position in the chamber. The shield ring, by engaging the frontside edge of the wafer, shields the edge of the top surface of the wafer, as well as the end edge and the backside of the wafer, during the deposition. Matching tapered edges, respectively, on the susceptor and the shield ring permit alignment of the shield ring with respect to the susceptor, and alignment of the wafer to the susceptor and the shield ring. Alignment means are also disclosed to circularly align the shield ring to its support in the chamber. Multi-unit shield rings permit the use of wider shield rings and prevent cracking of the shield ring due to thermal stresses caused by temperature differences near and away from the wafer during processing. These shield rings may also have tapered edges to ensure alignment of the rings with respect to each other.

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European Search Report EP 91120906.2.

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