Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Plasma
Inventor
active
Plasma immersion ion implantation process with chamber...
Plasma immersion ion implantation process with chamber...
Removal of surface dopants from a substrate
No associations
LandOfFree
Matthew D. Scotney-Castle does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Matthew D. Scotney-Castle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Matthew D. Scotney-Castle will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2301407