Processes involving lithographic materials

Details Processes involving lithographic materials Processes involving lithographic materials

1987-10-19

1990-01-09

Hoch, Raymond

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156662, 430272, 430313, 430317, B44C 122, G03C 500

Patent

active

048926175

ABSTRACT:
Extremely useful compositions for delineation of materials utilized in device applications have been found. These compositions include a polymer having segments that are at least 10 monomer units long of a first entity and segments again at least 10 monomer units long of a second entity. The monomer units are chosen so that each segment type provides a specific chemical characteristic to the polymer.

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Suzuki et al., "Copolymers of Trimethylsilylstyrene with Chloromethylstyrene for a Bi-Layer Resist System", Journal of the Electrochemical Society, vol. 130, No. 9, Sep. 1983, pp. 1962-1964.
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