Coating apparatus
Program, cyclic, or time control
Having prerecorded program medium
Inventor
active
Chemical vapor deposition of TiN films in a batch reactor
Deposition of TiN films in a batch reactor
Low temperature silicon compound deposition
Remote plasma activated nitridation
No associations
LandOfFree
Marinus J. De Blank does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Marinus J. De Blank, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Marinus J. De Blank will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2247197