4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle

Luminescent Technologies Inc.

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Mask patterns for use in multiple-exposure lithography

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Mask-pattern determination using topology types

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Method for time-evolving rectilinear contours representing...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method for time-evolving rectilinear contours representing...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method for time-evolving rectilinear contours representing...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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