Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2010-06-04
2011-11-08
Whitmore, Stacy (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S055000
Reexamination Certificate
active
08056021
ABSTRACT:
Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
REFERENCES:
patent: 4752957 (1988-06-01), Maeda
patent: 5242770 (1993-09-01), Chen et al.
patent: 5301101 (1994-04-01), MacArthur et al.
patent: 5418092 (1995-05-01), Okamoto
patent: 5489509 (1996-02-01), Kawabata et al.
patent: 5508803 (1996-04-01), Hibbs et al.
patent: 5525808 (1996-06-01), Irie et al.
patent: 5546189 (1996-08-01), Svetkoff et al.
patent: 5546225 (1996-08-01), Shiraishi
patent: 5640199 (1997-06-01), Garakani et al.
patent: 5707765 (1998-01-01), Chen
patent: 5889678 (1999-03-01), Inoue et al.
patent: 6022644 (2000-02-01), Lin et al.
patent: 6042998 (2000-03-01), Brueck et al.
patent: 6096567 (2000-08-01), Kaplan et al.
patent: 6123733 (2000-09-01), Dalton
patent: 6383847 (2002-05-01), Ditlow et al.
patent: 6468711 (2002-10-01), Sorori et al.
patent: 6484306 (2002-11-01), Bokor et al.
patent: 6563566 (2003-05-01), Rosenbluth et al.
patent: 6596466 (2003-07-01), Pohland et al.
patent: 6601192 (2003-07-01), Bowman-Amuah
patent: 6611627 (2003-08-01), LaRossa et al.
patent: 6617096 (2003-09-01), Burkhard
patent: 6677948 (2004-01-01), Wasserman et al.
patent: 6698007 (2004-02-01), Wu et al.
patent: 6703170 (2004-03-01), Pindo
patent: 6704920 (2004-03-01), Brill et al.
patent: 6718291 (2004-04-01), Shapiro et al.
patent: 6733929 (2004-05-01), Pierrat
patent: 6756980 (2004-06-01), Hayashi
patent: 6764795 (2004-07-01), Aton et al.
patent: 6787271 (2004-09-01), Cote
patent: 6795069 (2004-09-01), Raskar et al.
patent: 6798412 (2004-09-01), Cowperthwaite
patent: 6799313 (2004-09-01), LaCour
patent: 6809797 (2004-10-01), Baselmans et al.
patent: 6880135 (2005-04-01), Chang et al.
patent: 6968532 (2005-11-01), Sivakumar et al.
patent: 7027658 (2006-04-01), Osher et al.
patent: 7031538 (2006-04-01), Osher et al.
patent: 7073162 (2006-07-01), Cobb et al.
patent: 7124394 (2006-10-01), Abrams et al.
patent: 7175945 (2007-02-01), Mieher et al.
patent: 7178127 (2007-02-01), Abrams et al.
patent: 7231628 (2007-06-01), Pack et al.
patent: 7236123 (2007-06-01), Siegel
patent: 7302090 (2007-11-01), Kalus et al.
patent: 7353145 (2008-04-01), Tanaka et al.
patent: 7403641 (2008-07-01), Nakamoto et al.
patent: 7441227 (2008-10-01), Abrams et al.
patent: 7480889 (2009-01-01), Abrams et al.
patent: 7496880 (2009-02-01), Melvin et al.
patent: 7512927 (2009-03-01), Gallatin et al.
patent: 7571423 (2009-08-01), Abrams et al.
patent: 7698665 (2010-04-01), Abrams et al.
patent: 7703068 (2010-04-01), Abrams et al.
patent: 7707541 (2010-04-01), Abrams et al.
patent: 7757201 (2010-07-01), Abrams et al.
patent: 2002/0028393 (2002-03-01), Laidig et al.
patent: 2002/0066069 (2002-05-01), Ashida et al.
patent: 2002/0177050 (2002-11-01), Tanaka
patent: 2002/0188924 (2002-12-01), Pierrat et al.
patent: 2003/0016864 (2003-01-01), McGee et al.
patent: 2003/0095267 (2003-05-01), Mieher et al.
patent: 2003/0103189 (2003-06-01), Neureuther et al.
patent: 2003/0106642 (2003-06-01), Fairbairn
patent: 2003/0123707 (2003-07-01), Park
patent: 2003/0140330 (2003-07-01), Tanaka et al.
patent: 2003/0152841 (2003-08-01), Averbukh
patent: 2003/0165749 (2003-09-01), Fritze et al.
patent: 2003/0198872 (2003-10-01), Yamazoe et al.
patent: 2004/0008880 (2004-01-01), Horie et al.
patent: 2004/0021660 (2004-02-01), Ng-Thow-Hing et al.
patent: 2004/0031013 (2004-02-01), Dulman et al.
patent: 2004/0073884 (2004-04-01), Kroyan
patent: 2004/0086792 (2004-05-01), Romeo et al.
patent: 2004/0101766 (2004-05-01), Mesuda et al.
patent: 2004/0136587 (2004-07-01), Kalus et al.
patent: 2004/0147121 (2004-07-01), Nakagaki et al.
patent: 2004/0161678 (2004-08-01), Misaka
patent: 2004/0166422 (2004-08-01), Yamazoe et al.
patent: 2004/0214096 (2004-10-01), Dulman et al.
patent: 2004/0229133 (2004-11-01), Socha et al.
patent: 2004/0265707 (2004-12-01), Socha
patent: 2005/0066300 (2005-03-01), Zach
patent: 2005/0122500 (2005-06-01), Ye et al.
patent: 2005/0136340 (2005-06-01), Baselmans et al.
patent: 2005/0142470 (2005-06-01), Socha et al.
patent: 2005/0147893 (2005-07-01), Ogawa et al.
patent: 2005/0191566 (2005-09-01), Liu et al.
patent: 2005/0251771 (2005-11-01), Robles
patent: 2005/0265605 (2005-12-01), Nakamoto et al.
patent: 2006/0049978 (2006-03-01), Siegel
patent: 2006/0051682 (2006-03-01), Hess et al.
patent: 2006/0273242 (2006-12-01), Hunsche et al.
patent: 2007/0133862 (2007-06-01), Gold et al.
patent: 2010/0251203 (2010-09-01), Abrams et al.
patent: 2010/0275176 (2010-10-01), Abrams et al.
patent: WO 2007/033362 (2007-03-01), None
patent: WO 2007/033362 (2007-03-01), None
patent: WO 2007/044630 (2007-04-01), None
patent: WO 2007/044630 (2007-04-01), None
A. Rosenbluth et. al, “Optimum mask and source patterns to print a given shape”, JM3vol. 1 No. 1 pp. 13-30 (2002).
B.E.A. Saleh and S.I. Sayegh, “Reductions of errors of microphotographic reproductions by optical corrections of original masks”, Optical Eng. vol. 20, No. 5 pp. 781-784 (1981).
Chen, C. Y. et al, “Mask defect auto disposition based on aerial image in mask product”, Proc. SPIE 7379, 73791F (2009).
Erdmann et al., Enhancements in Rigorous Simulation of Light Diffraction from Phase Shaft Masks, Mar. 2002, SPIE, vol. 4691, pp. 1156-1167.
Gordon et al., Lithography simulation employing rigorous solution of Maxwell's equations, Feb. 1998, SPIE, vol. 3334, pp. 176-196.
J.A. Sethian and D. Adalsteinsson, “An overview of level set methods for etching, deposition, and lithography development”, IEEE Trans. on Semiconductor Manufacturing, vol. 10, No. 1, pp. 167-184, Feb. 1997.
J.A. Sethian and D. Adalsteinsson, “An overview of level set methods for etching, deposition, and lithography development”, IEEE Trans. on Semiconductor Manufacturing, vol. 10, No. 1, pp. 1-30, Jan. 8, 1996.
J.M. Berg and N. Zhou, “Shape-based optimization of a plasma etching process”, 39thIEEE Conf. on Decision and Control, pp. 2023-2028 (Dec. 2000).
J.M. Geremia and H. Rabitz, “Optimal Hamiltonian identification: the synthesis of quantum optimal control and quantum inversion”, J. Chem. Physics, vol. 118, No. 12 pp. 5369-5382 (Mar. 2003).
K.M. Nashold and B.E.A. Saleh, “Image construction through diffraction-limited high-contrast imaging systems: an iterative approach”, J. Opt. Soc. Am.A, vol. 2, No. 5 pp. 635-643 (1985).
Khan, M. et al, “A Semi-Empirical Resist Dissolution Model for Sub-micron Lithographies”, pp. 41-46, by Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems, 1998.
Nicolas Bailey Cobb, PhD Thesis, “Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing”, U.C. Berkeley, Spring 1998.
S. Osher and R. P. Fedkiw, “Level set methods: an overview and some recent results”, J. Computational Physics, vol. 169, No. 2, pp. 463 May 20, 2001.
Sethian, J.A., “Level set methods and fast marching methods,” 1999, Cambridge University Press, pp. 1-33.
Sethian, J.A., “Level set methods and fast marching methods,” 1999, Cambridge University Press, pp. 316-360 (printed from website http://math.berkeley.edu/˜sethian/level—set.html).
Wong et al., Massively Parallel Electromagnetic Simulation for Photolithographic Applications, Oct. 1995, IEEE, vol. 14, pp. 1231-1240.
Y. Liu and A. Zakhor, “Binary and phase-shifting image design for optical lithography”, Proc. SPIE vol. 1463 pp. 382-399 (1991).
Y. Liu and A. Zakhor, “Optimal binary image design
Abrams Daniel
Osher Stanley
Peng Danping
Luminescent Technologies Inc.
Whitmore Stacy
Wilson Sonsini Goodrich & Rosati
LandOfFree
Method for time-evolving rectilinear contours representing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for time-evolving rectilinear contours representing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for time-evolving rectilinear contours representing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4310437