Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-10-16
2008-10-21
Whitmore, Stacy A (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
Reexamination Certificate
active
07441227
ABSTRACT:
Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.
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Amendment and Response, filed Aug. 12, 2005, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,928, “Method for Time-Evolving Rectilinear Contours Representing Photo Masks,” filed Apr. 6, 2003, issued as U.S. Patent No. 7,124,394 on Oct. 17, 2006.
Office Action issued by U.S. Patent and Trademark Office, dated Feb. 14, 2005, in Abrams, Daniel et al., U.S. Appl. No. 10/408,928, “Method for Time-Evolving Rectilinear Contours Representing Photo Masks,” filed Apr. 6, 2003, issued as U.S. Patent No. 7,124,394 on Oct. 17, 2006.
Office Action issued by U.S. Patent and Trademark Office, mailed Mar. 8, 2005, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
Reply to Office Action , mailed Sep. 8, 2005, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
Office Action issued by U.S. Patent and Trademark Office, mailed Nov. 18, 2005, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
Reply to Office Action, mailed May 18, 2006, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
Office Action issued by U.S. Patent and Trademark Office, mailed Jul. 14, 2006, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
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Office Action issued by U.S. Patent and Trademark Office, mailed Jun. 20, 2007, in Abrams, Daniel S., et al., U.S. Appl. No. 10/408,924, “Optimized Photomasks for Photolithography,” filed Apr. 6, 2003.
Office Action issued by U.S. Patent and Trademark Office, mailed Sep. 25, 2007, in Abrams, Daniel S., et al., U.S. Appl. No. 11/549,846, “Method for Time-Evolving Rectilinear Contours Representing Photo Masks,” filed Oct. 16, 2
Abrams Daniel
Osher Stanley
Peng Danping
Luminescent Technologies Inc.
Whitmore Stacy A
Wilson Sonsini Goodrich & Rosati
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