4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Kunihiko Hinata

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Etchant for use in a semiconductor processing method and system

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma processing apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Plasma processing apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

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Semiconductor processing method and system using C.sub.5 F.sub.8

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Profile ID: LFUS-PAI-P-392381

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