4. Radiation imagery chemistry: process, composition, or product th
  5. Including control feature responsive to a test or measurement

Konstantinos P. Giapis

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Downstream ammonia plasma passivation of GaAs

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent

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Method and apparatus for providing flow-stabilized...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate

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Method for monitoring photoresist latent images

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent

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Method for monitoring photoresist latent images

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent

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Plasma etching apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Profile ID: LFUS-PAI-P-323230

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