Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1992-03-26
1994-02-22
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430945, 356354, G03F 720
Patent
active
052885720
ABSTRACT:
The formation of latent images in photoresist can be monitored during exposure without spurious images by directing a pulsed beam of monochromatic light onto a region of the layer being exposed and selectively detecting the diffracted light. Peak formation in the normalized diffracted intensity versus time curve indicates optimal exposure of the resist.
REFERENCES:
patent: 4142107 (1979-02-01), Hatzakis
patent: 4500615 (1985-02-01), Iwai
patent: 4851311 (1989-07-01), Millis
patent: 5124216 (1992-06-01), Giapis
Giapis Konstantinos P.
Gottscho Richard A.
Green Christian A.
AT&T Laboratories
Books Glen E.
Duda Kathleen
McCamish Marion E.
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