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Kevin D. Lucas

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Layout modification using multilayer-based constraints

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
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Lithography correction method and device

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
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Method for manufacturing a lithographic reticle for...

Semiconductor device manufacturing: process – Making device array and selectively interconnecting – With electrical circuit layout
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Non-resolving mask tiling method for flare reduction

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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One dimensional lithographic proximity correction using DRC shap

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
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Profile ID: LFUS-PAI-P-1088661

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