Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
Inventor
active
Boron trifluoride system for plasma etching of silicon dioxide
Method of selectively etching silicon dioxide with SF.sub.6 /nit
SF6/nitriding gas/oxidizer plasma etch system
No associations
LandOfFree
Kenneth M. Thrun does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Kenneth M. Thrun, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Kenneth M. Thrun will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-235758