Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-11-05
1986-10-07
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156653, 156657, 1566591, 156662, 20419237, 252 791, B44C 122, C03C 1500, C03C 2506, H01L 21306
Patent
active
046157646
ABSTRACT:
A gaseous mixture of SF.sub.6, a nitriding gas component and an oxidizer gas component is disclosed as an effective SiO.sub.2 etchant having enhanced selectively for use in either the plasma or reactive ion etch process. By adding an oxidizing gas to the SF.sub.6 nitriding gas plasma etchant, the selectively for SiO.sub.2 over silicon or polysilicon is marked improved. The optional addition of an inert diluent gas did not substantially change these results.
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Bobbio Stephen M.
DePrenda Ralph L.
Flanigan Marie C.
Thrun Kenneth M.
Allied Corporation
Friedenson Jay P.
Plantamura Arthur J.
Powell William A.
Stewart, II Richard C.
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