4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Kazuto Ohbuchi

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Method for forming multi-layer wiring structure

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method for forming multi-layer wiring structure

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method for forming multi-layer wiring structure

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Plasma processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Simultaneous discharge device

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-328135

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