Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1997-02-24

1998-12-08

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 118723R, 156345, C23C 1600

Patent

active

058463291

ABSTRACT:
A plasma processing apparatus has first and second electrodes disposed around a tubular chamber for generating a plasma. Each of the first and second electrodes comprises a plurality of web-shaped electrode segments spaced by a constant distant and disposed substantially halfway around the chamber. Each of the web-shaped electrode segments has opposite ends fastened to a pair of respective insulators disposed diametrically opposite to each other across the chamber. The web-shaped electrode segments of the first electrode are electrically connected to each other by a conductor on one of the insulators, and the web-shaped electrode segments of the second electrode are electrically connected to each other by a conductor on the other conductors. The first electrode is connected to a high-frequency power supply, and the second electrode is connected to ground.

REFERENCES:
patent: 5146137 (1992-09-01), Gesche et al.
patent: 5385624 (1995-01-01), Amemiya et al.
patent: 5435880 (1995-07-01), Minato et al.
patent: 5494522 (1996-02-01), Moriya et al.
patent: 5587207 (1996-12-01), Govokhovsky
patent: 5591268 (1997-01-01), Usue et al.
patent: 5681418 (1997-10-01), Ishimani

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