Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2011-06-14
2011-06-14
Lindsay, Jr., Walter L (Department: 2812)
Coating apparatus
Gas or vapor deposition
C118S7230VE, C118S7230ER, C118S7230MP, C117S089000, C117S206000, C427S255320, C427S255380, C427S255393, C428S698000, C438S491000, C438S495000, C438S566000, C438S784000
Reexamination Certificate
active
07959733
ABSTRACT:
A film formation apparatus for a semiconductor process includes a source gas supply circuit to supply into a process container a source gas for depositing a thin film on target substrates, and a mixture gas supply circuit to supply into the process container a mixture gas containing a doping gas for doping the thin film with an impurity and a dilution gas for diluting the doping gas. The mixture gas supply circuit includes a gas mixture tank disposed outside the process container to mix the doping gas with the dilution gas to form the mixture gas, a mixture gas supply line to supply the mixture gas from the gas mixture tank into the process container, a doping gas supply circuit to supply the doping gas into the gas mixture tank, and a dilution gas supply circuit to supply the dilution gas into the gas mixture tank.
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Chou Pao-Hwa
Hasebe Kazuhide
Kim Chaeho
Lindsay, Jr. Walter L
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Pompey Ron
Tokyo Electron Limited
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