Film formation apparatus and method of using the same

Details Film formation apparatus and method of using the same Film formation apparatus and method of using the same

2005-08-24

2009-10-20

Kackar, Ram N. (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C156S345240, C156S345250, C216S059000, C216S060000, C216S067000

Reexamination Certificate

active

07604010

ABSTRACT:
A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

REFERENCES:
patent: 5812403 (1998-09-01), Fong et al.
patent: 5879574 (1999-03-01), Sivaramakrishnan et al.
patent: 6207008 (2001-03-01), Kijima
patent: 6366346 (2002-04-01), Nowak et al.
patent: 6620108 (2003-09-01), Duval et al.
patent: 2003/0136425 (2003-07-01), Murugesh et al.
patent: 3-293726 (1991-12-01), None
patent: 7-188932 (1995-07-01), None
patent: 9-53180 (1997-02-01), None
patent: 10-256244 (1998-09-01), None
patent: 2002-35706 (2002-02-01), None
patent: 2004-343026 (2004-12-01), None
patent: 2003-0065461 (2003-08-01), None

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