4. Metal treatment
  5. Barrier layer stock material, p-n type
  6. With contiguous layers of different semiconductive material

Katsushi Akita

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Epitaxial wafer having a gallium nitride epitaxial layer...

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Reexamination Certificate

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Gallium-nitride deposition substrate, method of...

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
Reexamination Certificate

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Gallium-nitride deposition substrate, method of...

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
Reexamination Certificate

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GaN substrate, substrate with epitaxial layer, semiconductor...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with preceding...
Reexamination Certificate

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Group III nitride semiconductor device and epitaxial substrate

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular dopant material
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