CVD coating device

Details CVD coating device CVD coating device

2006-06-27

2006-06-27

Kackar, Ram N (Department: 1763)

Coating apparatus

Gas or vapor deposition

Work support

C118S725000, C118S715000, C118S724000, C219S648000, C204S298010, C156S345520, C156S345550

Reexamination Certificate

active

07067012

ABSTRACT:
The invention relates to a device for depositing especially, crystalline layers onto one or more, especially, also crystalline substrates in a process chamber using reaction gases which are guided into said process chamber, where they undergo pyrolytic reaction. The device has a heatable support plate wherein at least one substrate holder lies loosely, especially rotationally, with its surface flush with the surroundings. A compensation plate which adjoins the at least one substrate holder, following the contours of the same, is provided on the support plate in order to keep the isothermal profile on the support plate as flat as possible.

REFERENCES:
patent: 5782979 (1998-07-01), Kaneno et al.
patent: 5820686 (1998-10-01), Moore
patent: 19813523 (1999-10-01), None
patent: 60058613 (1985-04-01), None
patent: 02212394 (1990-08-01), None

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