4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Jane E. Buehler

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Copper sputtering target assembly and method of making same

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Copper sputtering target assembly and method of making same

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Copper sputtering target assembly and method of making same

Alloys or metallic compositions – Copper base
Reexamination Certificate

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Copper-containing sputtering targets, and methods of forming...

Metal treatment – Stock – Copper base
Reexamination Certificate

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Methods of forming copper-containing sputtering targets

Metal treatment – Process of modifying or maintaining internal physical... – Producing or treating layered – bonded – welded – or...
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Profile ID: LFUS-PAI-P-1899164

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