Metal treatment – Stock – Copper base
Reexamination Certificate
2005-02-22
2005-02-22
Ip, Sikyin (Department: 1742)
Metal treatment
Stock
Copper base
C148S433000, C420S470000, C420S472000, C420S497000, C420S499000, C420S500000
Reexamination Certificate
active
06858102
ABSTRACT:
The invention includes a sputtering target containing copper of a purity of at least about 99.999 wt. %, and at least one component selected from the group consisting of Ag, Sn, Te, In, B, Bi, Sb, and P dispersed within the copper. The total of Ag, Sn, Te, In, B, Bi, Sb, and P within the copper is from at least 0.3 ppm to about 10 ppm. The sputtering target has a substantially uniform grain size of less than or equal to about 50 micrometers throughout the copper and the at least one component.
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Buehler Jane E.
Kardokus Janine K.
Parfeniuk Christopher L.
Wu Chi tse
Honeywell International , Inc.
Ip Sikyin
Wells St. John P.S.
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