4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

James G. Rietzel

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Cylindrical magnetron shield structure

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Cylindrical magnetron with self cleaning target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Gas injector for plasma enhanced chemical vapor deposition

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-189522

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