Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-01-23
1996-06-18
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20429811, 20429822, C23C 1435
Patent
active
055274390
ABSTRACT:
An improved shield structure for use in a sputtering apparatus for depositing a film on a substrate is disclosed. The cylindrically shaped shield structure, which extends over the ends of a cylindrical sputtering target, has at least one annular structure extending around an outside surface of the shield. The annular structure is dimensioned to interrupt or suppress movement of any arc which might otherwise travel across its outside surface. In a preferred embodiment, the annular structure is a groove capable of trapping any such arc therein and preventing its escape therefrom. In another preferred embodiment, the improved shield structure is electrically isolated such that it is prevented from becoming an anode. In this manner, the electrically isolated shield structure inhibits the formation of severe arcs between it and the cathodic target. Further, with its arc-suppressing annular structure, the electrically isolated shield structure inhibits movement of any such severe arcs which might otherwise travel across the shield surface toward the support blocks, the vacuum chamber or other anode.
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Allen Norman E.
Rietzel James G.
Sieck Peter A.
Draegert David A.
Pace Salvatore P.
The BOC Group Inc.
Weisstuch Aaron
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