Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-05-01
2000-09-12
Jones, Dwayne C.
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 118718, 118722, 118723MP, 1562722, 156345, 20429807, 20429833, C23C 1600
Patent
active
061161853
ABSTRACT:
The use of a gas injector including a dielectric material around the ports has an advantage when used with plasma enhanced chemical vapor deposition in that a plasma torch will not be formed at the gas injector and the gases will not dissociate prematurely. This adds to the quality of the coatings and allows the system to be used at higher amperage and thus improved line speeds. The use of a dielectric plug at the ports allows the ports to be easily serviced and replaced.
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Rietzel James G.
Woolley Christopher P.
Delacroix-Muirheid C.
Jones Dwayne C.
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