Cylindrical magnetron with self cleaning target

Details Cylindrical magnetron with self cleaning target Cylindrical magnetron with self cleaning target

2006-03-21

2006-03-21

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298210

Reexamination Certificate

active

07014741

ABSTRACT:
A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the ends and any resultant arcing, resulting in a more reliable magnetron requiring less service and a magnetron that produces more consistent coatings.

REFERENCES:
patent: 4169031 (1979-09-01), Brors
patent: 4407713 (1983-10-01), Zega
patent: 5047131 (1991-09-01), Wolfe et al.
patent: 5096562 (1992-03-01), Boozenny et al.
patent: 5100527 (1992-03-01), Stevenson et al.
patent: 5108574 (1992-04-01), Kirs et al.
patent: 5171411 (1992-12-01), Hillendahl et al.
patent: 5213672 (1993-05-01), Hartig et al.
patent: 5225057 (1993-07-01), LeFebvre et al.
patent: 5262032 (1993-11-01), Hartig et al.
patent: 5298137 (1994-03-01), Marshall, III
patent: 5338422 (1994-08-01), Belkind et al.
patent: 5364518 (1994-11-01), Hartig et al.
patent: 5384021 (1995-01-01), Thwaites
patent: 5445721 (1995-08-01), Bower
patent: 5464518 (1995-11-01), Sieck et al.
patent: 5487821 (1996-01-01), Sieck et al.
patent: 5518592 (1996-05-01), Bower et al.
patent: 5527439 (1996-06-01), Sieck et al.
patent: 5529674 (1996-06-01), Hedgcoth
patent: 5591314 (1997-01-01), Morgan et al.
patent: 5616225 (1997-04-01), Sieck et al.
patent: 5627435 (1997-05-01), Jansen et al.
patent: 5631050 (1997-05-01), Thwaites
patent: 5645699 (1997-07-01), Sieck
patent: 5683558 (1997-11-01), Sieck et al.
patent: 5725746 (1998-03-01), Dickey et al.
patent: 5798027 (1998-08-01), Lefebvre et al.
patent: 5814195 (1998-09-01), Lehan et al.
patent: 5853816 (1998-12-01), Vanderstraeten
patent: 5904952 (1999-05-01), Lopata et al.
patent: 5922176 (1999-07-01), Caskey
patent: 6375814 (2002-04-01), De Bosscher et al.
patent: 6673221 (2004-01-01), Lynn et al.
patent: 6736948 (2004-05-01), Barrett
patent: 239807 (1986-10-01), None
patent: WO 99/54911 (1999-10-01), None
patent: WO 00 00766 (2000-01-01), None

Affiliated with

Also associated with

Rating

Cylindrical magnetron with self cleaning target does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cylindrical magnetron with self cleaning target, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cylindrical magnetron with self cleaning target will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3564243