Coating apparatus
Gas or vapor deposition
With treating means
Inventor
active
Method of processing a workpiece in a plasma reactor with...
Plasma process uniformity across a wafer by controlling a...
Plasma process uniformity across a wafer by controlling RF...
Plasma reactor overhead source power electrode with low...
Thin film processing plasma reactor chamber with radially upward
No associations
LandOfFree
James Carducci does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with James Carducci, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and James Carducci will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-1704591