4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

Jacques J. Bertrand

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Cobalt barrier for nickel silicidation of a gate electrode

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Method of forming nickel silicide using a one-step rapid...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Nickel silicide process using UDOX to prevent silicide shorting

Active solid-state devices (e.g. – transistors – solid-state diode – Mosfet type gate sidewall insulating spacer
Reexamination Certificate

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Process for forming fully silicided gates

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Stacked double sidewall spacer oxide over nitride

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2521356

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