4. Radiant energy
  5. With charged particle beam deflection or focussing
  6. With target means

Izumi Kasahara

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Electron beam lithography system for delineating a desired patte

Radiant energy – With charged particle beam deflection or focussing – With target means
Patent

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Method of checking pattern and apparatus therefor

Image analysis – Histogram processing – For setting a threshold
Patent

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Method of drawing a desired pattern on a target through exposure

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent

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Profile ID: LFUS-PAI-P-590447

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