Electron beam lithography system for delineating a desired patte

Details Electron beam lithography system for delineating a desired patte Electron beam lithography system for delineating a desired patte

1988-03-04

1989-09-19

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

2504922, H01J 3700

Patent

active

048683957

ABSTRACT:
In a system for continuously exposing desired patterns and their backgrounds on the surface of a target, a first electron beam emitted from a first electron gun is converged by condenser lenses and an objective lens to be focused on the surface of the target. A second electron beam emitted from a second electron gun is defocused at the target surface by a condenser lens and a deflecting coil. A deflector selects the first or second electron beams. While the target surface is being scanned with the selected electron beam, the beam is deflected by a scanning deflector. In delineating a pattern, the target surface is scanned with the first electron beam. In delineating a background, on the other hand, the target surface is scanned with the second electron beam.

REFERENCES:
patent: 4392058 (1983-07-01), Smith
Mauer et al., "Electron Optics of an Electron Beam Lithographic System," IBM J. Res. Develop., Electron Optics, Nov. 1977.

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