4. Coating processes
  5. Coating by vapor, gas, or smoke
  6. Mixture of vapors or gases utilized

Ikuo Shiota

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Method for forming ohmic contact

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Oxynitride film and its manufacturing method

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
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Oxynitride film and its manufacturing method

Stock material or miscellaneous articles – Composite – Of metal
Patent

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Oxynitride film and its manufacturing method

Stock material or miscellaneous articles – Composite – Of inorganic material
Patent

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Profile ID: LFUS-PAI-P-721095

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