4. Active solid-state devices (e.g., transistors, solid-state diode
  5. Field effect device
  6. Having insulated electrode

Hwa-Sung Rhee

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CMOS semiconductor device and method of manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – With specified impurity concentration gradient – Stepped profile
Reexamination Certificate

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Dual gate stack CMOS structure with different dielectrics

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Method for forming SOI substrate

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Reexamination Certificate

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Method of fabricating MOS transistor having epitaxial region

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method of fabricating MOS transistor using total gate...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2610673

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