4. Refrigeration
  5. Low pressure cold trap process and apparatus

Hiroyuki Takahama

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Apparatus for full wafer deposition

Coating processes – Coating by vapor – gas – or smoke
Patent

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Method and apparatus for cooling a vacuum device

Refrigeration – Low pressure cold trap process and apparatus
Patent

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Reduced friction lift pin

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Substrate support lift pin

Machines not elsewhere specified – Material working – abrading – or founding machinery – Element or attachment
Design Patent

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Profile ID: LFUS-PAI-P-1197362

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