Patent
1988-07-25
1990-09-04
Walberg, Teresa J.
F27B 514
Patent
active
049546856
ABSTRACT:
A heating furnace for semiconductor wafers having a heater arranged around a core tube, layers of a heat insulating material made of a porous heat insulating material or ceramic fibers arranged around the heater, and layers of a heat reflecting material arranged in the layers of the heat insulating material.
REFERENCES:
patent: 1837178 (1931-12-01), Benner
patent: 2145324 (1939-01-01), Stauss
patent: 3009601 (1961-11-01), Matsch
patent: 3170018 (1965-02-01), Lewis
patent: 3240915 (1966-03-01), Carter
patent: 3354257 (1967-11-01), Lang
patent: 3385921 (1968-05-01), Hampton
patent: 3525452 (1970-08-01), Hofmann
patent: 3644655 (1972-02-01), Vollmer
patent: 4313993 (1982-02-01), McGlory
patent: 4325694 (1982-04-01), Bergman
patent: 4666760 (1987-05-01), Hasuda
patent: 4754377 (1988-06-01), Wenman
Imai Yoshio
Kumagai Hiromi
Sato Kaoru
Tokyo Electron Limited
Walberg Teresa J.
LandOfFree
Heating furnace for semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Heating furnace for semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heating furnace for semiconductor wafers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-443679