4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle

Hiroki Futatsuya

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Light intensity simulation method, program product, and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method and equipment for simulation

Data processing: structural design – modeling – simulation – and em – Simulating nonelectrical device or system
Reexamination Certificate

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Method for manufacturing a photomask

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Method for manufacturing a photomask

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Proximity effect correction apparatus, proximity effect...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2203718

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