Method and equipment for simulation

Details Method and equipment for simulation Method and equipment for simulation

2004-02-23

2009-08-18

Rodriguez, Paul L (Department: 2123)

Data processing: structural design, modeling, simulation, and em

Simulating nonelectrical device or system

C716S030000

Reexamination Certificate

active

07577556

ABSTRACT:
The simulation equipment has division unit for dividing a layout of a photo mask (mask layout) into a plurality of areas, average light intensity value calculation unit for calculating an average value of light intensity in each of the areas, smoothing unit for subjecting the calculated average value to smoothing processing, and multiplication unit for multiplying the smoothed average value by a predetermined multiplier.

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Andreas Erdmann et al.; “Enhancements in Rigorous Simulation of Light Diffraction from Phase Shift Masks”, 2002, Proceedings of SPIE, vol. 4691, pp. 1156-1167.
Chris A. Mack; “Measuring and Modeling Flare in Optical Lithography”, Jun. 2003, Optical Microlithography XVI, Proceedings of the SPIE, vol. 5040, pp. 151-161.
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