4. Semiconductor device manufacturing: process
  5. Including control responsive to sensed condition
  6. Electrical characteristic sensed

Hiroji Hanawa

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Apparatus for monitoring a metal layer during chemical...

Abrading – Precision device or process - or with condition responsive... – Computer controlled
Reexamination Certificate

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Automatic frequency tuning of an RF plasma source of an inductiv

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Automatic frequency tuning of an RF power source of an inductive

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Broad-band adjustable power ratio phase-inverting plasma reactor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Chemical vapor deposition plasma process using an ion shower...

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-169882

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