4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Hirofumi Kitayama

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Apparatus for feeding gases for use in semiconductor...

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Apparatus for reaction treatment

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Conductor treating single-wafer type treating device and...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Heat treating apparatus

Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Patent

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Heat treating method and device

Heating – Processes of heating or heater operation – Including preparing or arranging work for heating
Patent

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Profile ID: LFUS-PAI-P-7574

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