Apparatus for reaction treatment

Details Apparatus for reaction treatment Apparatus for reaction treatment

1989-08-11

1991-02-05

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118724, 118725, 118730, 156345, 156646, C23C 1600

Patent

active

049895400

ABSTRACT:
A treatment apparatus used in manufacturing processes for semiconductor devices and the like, in which substrates are treated by means of a reaction gas. An inner tube, which is coaxially disposed in a reaction tube, defines a reaction region surrounding the substrates to be treated. The inner tube has a number of perforations in its wall, by means of which the inside and outside of the reaction region communicate with each other. During reaction treatment, the reaction gas is supplied to the reaction region, while a cleaning gas is supplied to the region outside the reaction region. Both these gases are discharged through a common exhaust pipe. The flows of the reaction gas and the cleaning gas are controlled so that the pressure inside the reaction region is higher than the pressure outside the region. As the cleaning gas is supplied, production and adhesion of reaction compound particles on the inner surface of the reaction tube is prevented.

REFERENCES:
patent: 4430149 (1984-02-01), Berkman

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