Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-06-26
2007-06-26
MacArthur, Sylvia R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C361S234000, C156S345530, C118S712000
Reexamination Certificate
active
10466116
ABSTRACT:
A single-substrate processing apparatus (20) has a worktable (40) disposed in a process chamber (24), which accommodates a target substrate (W). The worktable (40) has a thermally conductive mount surface (41) to place the target substrate (W) thereon. The worktable (40) is provided with a flow passage (50) formed therein, in which a thermal medium flows for adjusting temperature of the target substrate (W) through the mount surface (41). The flow passage (50) is connected to a thermal medium supply system (54), which selectively supplies a cooling medium and a heating medium.
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Kitayama Hirofumi
Matsushima Noriaki
MacArthur Sylvia R.
Tokyo Electron Limited
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