Optical element and projection exposure apparatus employing the

Details Optical element and projection exposure apparatus employing the Optical element and projection exposure apparatus employing the

1994-02-14

1996-01-16

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 34, G21K 500

Patent

active

054854970

ABSTRACT:
An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X-radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other. When the optical element is irradiated to replicate or image the patterns of the optical element, refined patterns can be replicated or imaged.

REFERENCES:
patent: 4192994 (1980-03-01), Kastner
patent: 4411013 (1983-10-01), Takasu et al.
patent: 4891830 (1990-01-01), Iwahashi
patent: 5003567 (1991-03-01), Hawryluk et al.
patent: 5052033 (1991-09-01), Ikeeta et al.
Japanese Journal of Applied Physics, vol. 30, No. 11B, Nov., 1991, "Soft X-Ray Reduction Lithography Using Multilayer Mirrors", H. Kinoshita et al, pp. 3048-3052.
Extended Abstracts of the 18th (1986 International) Conference on Solid State Devices and Materials, Tokyo, 1986, "Theoretical Consideration on New Reflection Type X-Ray Lithography", H. Matsumura, pp. 17-20.

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